magnetron sputtering vacuum coating system
Found 103 製品
PVDスパッタリングイオンコーティング機 磁気スパッタリングコーター 金属膜電子分野の作製に使用
Introduction PRODUCT PRESENTATION A magnetron sputtering coater is a device based on magnetron sputtering technology. It uses magnetic field constrained ions to bombard targets, depositing uniform, dense films on substrates. Why it's good : It is known for producing uniform, dense films with strong ...
パルスマグネトロンスプートリングコーティング機器 グラスコーティング メナタル pvd真空コーティングマシン
Introduction Structure: It is composed of a pulse power supply module, a magnetron sputtering chamber, a target material assembly, a vacuum system, a substrate transmission and temperature control unit, as well as an online monitoring system, etc. Working principle: By outputting a pulse voltage ...
携帯電話装飾フィルムマグネトロンスパッタリングコーティング生産ライン
Equipment Composition 1.Vacuum system : Typically composed of mechanical pumps, Roots pumps, molecular pumps, etc., it can evacuate the coating chamber to a high vacuum state, providing the required vacuum environment for magnetron sputtering coating 2.Magnetron sputtering system : Including ...
マグネトロンスプッター生産のためのPLC制御付き,高均一性調整厚さの銀鏡コーティングライン
Silver Mirror Magnetron Sputtering Coated Glass Production Line Core Structure Complete integrated production system with multiple specialized units: Pretreatment Unit: Glass loading table, multi-stage cleaning machine (brush + ultrasonic), sensitization treatment tank, hot air dryer, edge film ...
着色ガラス用マグネトロンスパッタリングコーティング生産ライン
Introduction to the production line 1.Its core characteristics:continuity, high precision and automation. 2.It mainly consists of four parts: the substrate pretreatment unit, the vacuum coating unit, the post-treatment unit and the control system. 3.It can realize the full-process production from ...
ステンレス鋼ジュエリーに高成膜速度で本物の金コーティングを行うためのミニサイズマグネトロンスパッタリング成膜装置
Mini Small Size Magnetron Sputtering Real Gold Coating Machine Compact magnetron sputtering system designed specifically for applying real gold coatings to stainless steel jewelry with precision and efficiency. Accurate Real Gold Coating Technology Utilizes advanced magnetron sputtering technology ...
PVD Magnetron Sputtering Vacuum Coating Equipment Tools Hard Coating Machine
1. Core Functions 1. Diverse Coating Materials: It can prepare mainstream hard coatings such as TiN (titanium nitride), TiAlN (titanium aluminum nitride), CrN (chromium nitride), and DLC (diamond-like carbon), meeting performance requirements of different scenarios. 2. Precise Performance Control: ...
PVDスプッティングイオンコーティングマシン/多弧イオン磁石スプッティングPVDコーティングガラスジュエル
Introduction PRODUCT PRESENTATION Equipment features : It makes the film smooth and compact, and the film thickness can grow linearly. Equipment Application : Golf clubs, ceramics, glass products, mobile phone case, watch case bracelet, high-end jewelry, tableware, etc. Process color : Titanium gold...
垂直マグネトロンスパッタリングコーティング装置 PVD真空コーティング機 ガラスまたは金属用
Core Introduction Vertical magnetron sputtering coating equipment is a physical vapor deposition (PVD) device with a vertical structure design, where the substrate and the target material are arranged perpendicularly. It uses a magnetic field to confine the plasma, enabling ions to efficiently ...
高効率の生産 精密コーティング 品質 インテリジェント&柔軟性 適応 自動車ガラス用の磁気スプッターコーティングライン
Magnetron Sputtering Coating Automotive Glass Production Line Core Product Specifications Parameter Details Substrate Compatibility Max glass size: 1500×2000mm ~ 2440×3660mm (customizable); Thickness: 1.6-6mm Ultimate Vacuum ≤ 8.0×10⁻⁵Pa (coating chamber) Deposition Rate 0.5-2.5μm/min (reactive/non...
リアルタイムモニタリング 2500mm 作業幅とPVDコーティングのための完全自動フィードバック制御
Metal Substrate Continuous Magnetron Sputtering Coating Assembly Line Advanced PVD coating system designed for high-volume production of precision coatings on various substrates including glass, metal, and acrylic materials. Key Features & Capabilities High-output continuous coating line with annual ...
水平型大型低Eガラス真空コーティングライン ガラス磁気スプッターコーティング
The rotary sputter cathode has many advantages compared with planar sputter cathode, such like: Higher utilization rate of target material Higher applicable sputter power and increasing of sputter rates Stability working in AC power supply (less arcing and poisoning) Flexibility in target materials ...
